Taking nano to the next level
Mar 26, 2014
Sponsored by Oxford Instruments
This webinar focuses on recent advances in nanoscale etching and in atomic layer deposition (ALD) from research to manufacturing applications, with two industry-leading speakers.
Date: Wednesday 26 March 2014
Speaker: Deirdre Olynick, staff scientist, LBNL, US
ALD and nanoscale-etch processing techniques and results from recent work carried out at the Lawrence Berkeley National Laboratory (LBNL).
Speaker: Kim Lee, Seagate, US
The challenges of bit patterned media (BPM) recording by directed self-assembly (DSA), with possible solutions.
The webinar runs for 45 minutes.
Moderator: James Dacey, multimedia projects editor for Physics World