Fabrication of a photomask

Fabrication of a microfluidic photomask.(a) A photoresist micropattern is created on a silicon wafer. (b) A polymer replica of the silicon master is bonded to a spun polymer layer (about 10 microns thick). (c) The microchannels are filled with dye; the optical micrographs show the bottom view of a photomask featuring five channels. (d) The photoresist is developed. (e) Scanning electron micrograph of finished feature.

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