figure 1

The process
(a) Photolithography
(b) Etching
(c) and (d) Room temperature bonding
(e) Etchback
(f) Oxide underetch
(image credit: M Bring et al. 2003 J. Micromech. Microeng. 13 S51)

The process
(a) Photolithography
(b) Etching
(c) and (d) Room temperature bonding
(e) Etchback
(f) Oxide underetch
(image credit: M Bring et al. 2003 J. Micromech. Microeng. 13 S51)