SPIE Advanced Lithography 2012

Synopsis / Description:
SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
+ Advanced Etch Technology for Nanopatterning
Courses: Advanced Lithography 2012 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including EUV and double patterning. 2012 course lists and descriptions will be available September 2011.