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About this event

Web site
spie.org/advanced-…
When
2327 Feb 2014
Where
San Jose, CA, United States
Registration deadline
Feb 15, 2014
Organiser
SPIE - The International Society for Optics and Photonics
Contact address
Customer Service
1000 20th St
Bellingham
WA
United States
Tel
+1 360 676 3290
E-mail
customerservice@spie.org…

Conference/exhibition

SPIE Advanced Lithography 2014

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Advanced Etch Technology for Nanopatterning
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration

Courses: Advanced Lithography 2014 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2014 course lists and descriptions will be available October 2013.

Exhibition:

The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years.

See the latest technology in advanced lithography:
+ Etch Technology for nanopatterning
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Lasers
+ Resist materials and processing
+ Nano-imprint
+ IC and chip fabrication
+ Nanoscale imaging

Exhibition Dates and Hours:
Tuesday 25 February 2014 | 10:00 am to 5:00 pm
Wednesday 26 February 2014 | 10:00 am to 4:00 pm