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Nanoquest I - Ion Beam Etch System Jul 28, 2008
The NQI is an ideal R&D platform for Ion Beam Etch and Ion Beam Sputter.
The NQI is an ideal R&D platform for Ion Beam Etch and Sputter. The substrate stage design allows for high-rate substrate cooling during etch or deposition. The system will etch single wafers of 50mm to 100mm and can accommodate 3, 5, or 8cm Kaufman gridded ion sources.
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- Nanoquest I-LL - Load Locked Ion Beam Etch System Jul 25, 2008
