SPI Plasma Prep™ III Plasma Etcher Jun 8, 2009

The Plasma Prep III (PP III) is the new generation of the popular and long serving Plasma Prep II RF based unit. With its compact tabletop design and ease of use, the new generation now employs a solid state design to deliver the same 100W system performance. Furthermore, the small footprint allows the system to fit neatly in most any laboratory environment.

Features:
* Flexible range. Capable of 1 to 100W operation
* Greater stability
* Reproducible conditions.
* Same small footprint as the PP II (10.5" H X 14.75" W X 12" D measurements)
* Integrated vacuum gauge
* Measurement and adjustment of forward and reverse power
* Digital metering
* 110/220V compatible
* 4" diameter x 6" depth Pyrex or Quartz Chamber