JenLas® disk IR50 - New quality in solar cell processing Jan 28, 2010

The Laser Systems Business Unit will showcase its JenLas® disk IR50 for solar cell processing. The laser combines perfect beam quality in the infrared wavelength range at 1030 nm with a flexible tunable pulse length. Consequently, the 45-watt system is ideal for the laser drilling of silicon wafers, which then allow the efficient production of back-contact solar cells. The electrical efficiency of the cells can be increased through the use of MWT or EWT (Metal Wrap Through und Emitter Wrap Through) technology. In order to increase the active surface area of the cells, in the case of both technologies the contacts are laid from the front to the rear side of the cell.The contact finger that are currently used as standard and covers parts of the active surface area can therefore be dispensed.

More products from this company

• Jenoptik’s Femtosecond Laser for Optimal Application in Industry Jul 5, 2011
• Compact Green Disk Laser with Improved Output Power May 23, 2011
• Jenoptik: New Wavelengths in Laser Bars Jan 24, 2011
• Jenoptik: New Integrated qcw Module Jan 24, 2011
• Jenoptik: More Powerful, Highly Brilliant Diode Laser Module Jan 24, 2011
• Jenoptik: Optical Isolators Jan 24, 2011
• Extension of the Jenoptik Disk Laser Product Family for Micro Materials Processi Jan 24, 2011
• Expansion of the product range for solar cell processing Sep 8, 2010
• Jenoptiks low cost laser bars for 808 nm applications Jan 21, 2010