MAXIM SIMS/SNMS Workstation Feb 2, 2010

The system is under integrated PC control and is fully UHV compliant with a choice of oxygen, argon and caesium ion sources for broad-beam applications and for fine-focus operation to 20 micron spot size. The Workstation is configured to accept diverse sample types and, together with the inbuilt elemental surface imaging program, provides for quantitative analysis of surface composition and/or depth profile features.

The high-transmission mass spectrometer monitors both +ve and -ve ions, with the integral electron bombardment ion source mounted at the sample surface efficiently providing pre-ionisation of sputtered neutrals. Mass range is to 1000 amu and the system also offers high sensitivity for low molecular weight species such as boron, beryllium, lithium and monatomic hydrogen.

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