Join the audience for a live webinar at 3 p.m. BST/10 a.m. EDT on 6 May 2026
Discover the exciting world of epitaxial growth in view of advanced CMOS and 3D DRAM
Want to take part in this webinar?
A description of the evolution of metal-oxide-semiconductor device architectures and the corresponding requirements on epitaxial growth schemes will be followed by a discussion of the obtained material properties of Si/SiGe multilayer stacks used for logic and 3D DRAM devices, grown on 300 mm Si (001) wafers.
The process used to deposit Si/SiGe multilayers for Nano-Sheet devices has been extended to 120 pairs (241 sub-layers) of {65 nm Si/10 nm strained Si0.8Ge0.2} for 3D DRAM concepts [1]. A more complicated layer stack with two different Ge concentrations is required for the monolithic fabrication of complementary field effect transistor (CFET) devices, where gate-all-around nFETs and pFETs are stacked on top of each other [2]. A relatively high growth temperature provides acceptable Si and SiGe growth rates while still suppressing 3D island growth for SiGe growth with up to 40% Ge. Excellent structural and optical material properties of the epi stack will be reported, with up to 3 + 3 Si channels in the top and bottom part of the stack, respectively. For all layer designs, the absence/presence of lattice defects has been verified by several techniques including photoluminescence (PL) measurements at both room-temperature and low temperature.
[1] R. Loo et al., JAP 138, 055702 (2025), https://doi.org/10.1063/5.0260979
[2] R. Loo et al., ECS SST 14, 015003 (2025), https://iopscience.iop.org/article/10.1149/2162-8777/ada79f
Want to take part in this webinar?
Roger Loo joined imec in January 1997. Since October 2013 he has been a principal scientist (principal member of technical staff) in the group IV epi team. Since September 2023, he has also been a visiting professor (5%) at the Ghent University. He has authored or co-authored more than 240 articles in peer-reviewed journals. He has been co-editor of eight journal special issues, (co-)authored more than 250 articles in proceedings listed in Web of Science and has given more than 30 invited talks at international conferences. Loo regularly gives invited research seminars and tutorials at universities, institutes and companies. Loo has co-authored more than 90 patent filings (including provisional filings), among which more than 50 patents have been granted and are maintained. He has also (co-)organized about 24 international conferences.
