The AVS International Symposium and Exhibition provides the platform for discussing state-of-the-art advances in atomic-scale processing, characterization, measurement and simulation of materials, surfaces, interfaces and devices. From fundamental science to manufacturing, this week-long symposium fosters a multidisciplinary environment where participants from industry, government labs and academia can collaborate and explore research in vacuum technology, thin films, plasma science, microelectronic devices, quantum computing, 2D materials, nanostructures, biomaterials, surface and interfacial phenomena – and much more. An extensive exhibition of related equipment, tools, materials, supplies, chemicals, services, consulting, technical literature and new technologies are also showcased throughout the week.
Late news abstract deadline: 14 September 2026
Register by 5 October 2026 for early discount.
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