SPIE Photomask Technology 2013

The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, mask-making, and wafer fabrication.
Help solve the most pressing issues in:
Mask Making
+ Mask data preparation
+ Substrates and materials
+ Patterning tools and processes
+ Resist and resist processing
+ Etch techniques
+ Metrology
+ Inspection
+ Repair
+ Cleaning, contamination, and haze
+ Simulation of mask making
Emerging Mask Technologies
+ EUV mask making
+ EUV mask inspection and repair
+ EUV mask infrastructure
+ Nanoimprint mask making
+ Nanoimprint mask application
+ Pixelated masks
+ Alternative mask technologies
+ Mask process correction
+ Grey-scale masks
+ Direct-write, ML²
Mask Application
+ Double- and multi-patterning
+ Resolution enhancement techniques and OPC
+ Source and mask optimization
+ Design for manufacturability
+ Patterned media
+ Simulation and modeling
Mask Business
+ Mask manufacturing control
+ Mask shop management
+ Mask management in wafer fabs
+ Business aspects of mask
+ Infrastructure

Exhibition Dates and Hours:
Tuesday 10 September | 10:00 am to 4:30 pm; 6:30 pm to 8:00 pm
Wednesday 11 September | 10:00 am to 4:00 pm