This site uses cookies. By continuing to use this site you agree to our use of cookies. To find out more, see our Privacy and Cookies policy.
Skip to the content

Browse events




100 Second Science
Bright Recruits

At all stages of your career – whether you're an undergraduate, graduate, researcher or industry professional – brightrecruits.com can help find the job for you.

Find your perfect job

Physics connect

Are you looking for a supplier? Physics Connect lists thousands of scientific companies, businesses, non-profit organizations, institutions and experts worldwide.

Start your search today

Latest webinar

webinar

Exploring flatlands: fabrication technologies

A webinar sponsored by Oxford Instruments

Register for this free webinar

Featured video

Quorum Technologies' market-leading Q-series of bench-top vacuum coaters for electron microscopy (SEM and TEM) and thin-film applications.

Learn more – view video

Contact us for advertising information

About this event

Web site
spie.org/photomask…
When
1618 Sep 2014
Where
Monterey, California, United States
Registration deadline
Sep 1, 2014
Organiser
SPIE - The international society for optics and photonics
Contact address
Customer Service
1000 20th St
Bellingham
WA
United States
Tel
1 360 676 3290
E-mail
customerservice@spie.org…

Conference

SPIE Photomask Technology 2014

The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry.

Mask Making
+ Mask data preparation
+ Substrates and materials
+ Patterning tools and processes
+ Resist and resist processing
+ Etch techniques
+ Metrology
+ Inspection
+ Repair
+ Cleaning, contamination, and haze
+ Simulation of mask making
+ Mask process correction
Larger Glass, Smaller Fields, and Materials for 450mm
+ Impact of 450mm wafers on reticle and infrastructure
+ Tool developments to support larger blanks
+ Material developments
+ Interactions with magnifications
+ Impact of stitching for mask making and design
Emerging Mask Technologies
+ EUV mask making
+ EUV mask inspection and repair
+ EUV mask infrastructure
+ EUV mask application
+ Nano imprint mask making
+ Nano imprint mask application
+ Pixelated masks
+ Alternative mask technologies
+ Grey-scale masks
+ Direct-write, ML²
Mask Application
+ Double- and multi-patterning
+ Resolution enhancement techniques and OPC
+ Source/mask optimization
+ Design for manufacturability
+ Patterned media
+ Simulation and modeling
+ Inverse lithography technology
Mask Business
+ Mask manufacturing control
+ Mask shop management
+ Mask management in wafer fabs
+ Business aspects of masks
+ Infrastructure challenges