Available to watch now, IUVSTA, Hiden Analytical, MKS Instruments, Agilent Vacuum Technologies and Pfeiffer Vacuum explores the current trend and challenges in the manufacturing processes of advanced semiconductor devices
As the critical dimensions of semiconductor devices are approaching the atomic scale, continuous improvement of device performance can no longer rely on straightforward device shrinkage. The introduction of new three-dimensional structures and new materials, in addition to further reduction of device sizes, is now the main driving factor for higher device performance. The reduction of CO2 and other greenhouse gases is another growing challenge in the semiconductor manufacturing industry as the cost and energy consumption of device manufacturing continue to grow.
In this talk, after reviewing the current trend and challenges in the manufacturing processes of advanced semiconductor devices, Satoshi Hamaguchi will discuss the outlook of future technologies in this arena, especially plasma-processing technologies. It is now clear that the manufacturing processes strongly demand atomic-scale accuracy with little or no damage to the materials in device fabrication. The discussion will be focused on how the fundamental science of plasma surface interaction can contribute to the development of such technologies.
Satoshi Hamaguchi has been Professor of Engineering at the Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Osaka, Japan, since 2004. He has been working on analyses of plasma surface interaction for semiconductor processing and surface modification of biomaterials, using modelling, numerical simulations, and beam and plasma experiments. His interest also includes plasma medicine, nuclear fusion, and AI and machine learning applications in plasma science and technologies.
Prior to joining Osaka University, Dr Hamaguchi was Associate Professor of Energy Science, Graduate School of Energy Sciences, Kyoto University, Kyoto, Japan, from 1998 to 2004, Research Staff Member of Thomas J. Watson Research Center, IBM Research Division, IBM at Yorktown Heights, New York, USA, from 1990 to 1998, and Research Fellow at the Institute of Fusion Studies, University of Texas, Austin, Texas, USA, from 1988 to 1990.
Hamaguchi holds a PhD in mathematics from Courant Institute of Mathematical Sciences, Department of Mathematics, New York University, and a PhD in physics from the University of Tokyo. He is a Fellow of the American Vacuum Society and American Physical Society.